US Patent 9869650 Pattern inspection apparatus
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Patent abstract
A pattern inspection apparatus includes a column to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams, a stage to mount the substrate thereon and to be movable, a detector to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams, and a drive mechanism to move the detector in order to follow movement of the stage.
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Patent Inventor Names
Nobutaka Kikuiri0
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US Patent 09869650 Pattern inspection apparatus US Patent 9869650 Pattern inspection apparatus
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Patent Number
098696500
Patent Number
98696500
Edits on 23 Apr, 2023
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Patent Jurisdiction
Patent Number
098696500
Date of Patent
January 16, 2018
0Patent Application Number
154974250
Date Filed
April 26, 2017
0Patent Primary Examiner
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US Patent 09869650 Pattern inspection apparatus
Infobox
Is a
Patent jurisdiction
Patent number
09869650
Date of patent
January 16, 2018
Patent application number
15497425
Date Filed
April 26, 2017
Patent primary examiner
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