Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chin-Shan Wang0
Shun-Yi Lee0
Date of Patent
February 13, 2018
0Patent Application Number
151789030
Date Filed
June 10, 2016
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method of fabricating a semiconductor device. The method includes forming a dummy structure over a substrate, forming conductive features on opposite sides of the dummy gate structure, removing the dummy structure and a portion of the substrate beneath the dummy gate structure to form a trench, and filling the trench with a dielectric material.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
