US Patent D703160 Grounded electrode for a plasma processing apparatus

Patent D703160 was granted and assigned to Hitachi on April, 2014 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Hitachi

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D703160

Patent Inventor Names

Hidenobu Tanimura0

Date of Patent

April 22, 2014

Patent Application Number

29397274

Date Filed

July 14, 2011

Patent Citations Received

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US Patent D1008986 Ion shield plate for plasma processing apparatus

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US Patent 12080522 Preclean chamber upper shield with showerhead

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US Patent D1040304 Deposition ring for physical vapor deposition chamber

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