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US Patent D1008986 Ion shield plate for plasma processing apparatus

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Yasushi Sonoda0

Taku Iwase0

Masahiro Yamaoka0

Yusuke Nakatani0

Kazuumi Tanaka0

Date of Patent

December 26, 2023

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Patent Application Number

297899290

Date Filed

October 25, 2021

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Patent Citations

US Patent D802545 Lower chamber for a plasma processing apparatus

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US Patent D667561 Sample processing disk cover

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US Patent D703160 Grounded electrode for a plasma processing apparatus

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US Patent D789888 Electrode plate for semiconductor manufacturing apparatus

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US Patent D794753 Showerhead for a semiconductor processing chamber

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US Patent D840364 Electrode cover for a plasma processing apparatus

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US Patent D868993 Electrode plate for a plasma processing apparatus

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US Patent D870314 Electrode cover for a plasma processing apparatus

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Patent Citations Received

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Patent Primary Examiner

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CPC Code

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