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US Patent D870314 Electrode cover for a plasma processing apparatus

Patent D870314 was granted and assigned to Hitachi on December, 2019 by the United States Patent and Trademark Office.

Overview Structured Data Issues Contributors Activity

Is a

Patent

Patent attributes

Patent Applicant

Hitachi

Current Assignee

Hitachi

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D8703140

Patent Inventor Names

Kenetsu Yokogawa0

Masahito Mori0

Masakazu Isozaki0

Takao Arase0

Yousuke Sakai0

Date of Patent

December 17, 2019

Patent Application Number

296352920

Date Filed

January 30, 2018

Patent Citations Received

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US Patent D1008986 Ion shield plate for plasma processing apparatus

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US Patent D1049067 Ring for an anti-rotation process kit for a substrate processing chamber

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US Patent 11996315 Thin substrate handling via edge clamping

Patent Primary Examiner

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Susan Bennett Hattan

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