US Patent D802545 Lower chamber for a plasma processing apparatus

Patent D802545 was granted and assigned to Hitachi on November, 2017 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Patent Applicant

Hitachi

Current Assignee

Hitachi

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D8025450

Patent Inventor Names

Kohei Sato0

Susumu Tauchi0

Takashi Uemura0

Date of Patent

November 14, 2017

Patent Application Number

295440710

Date Filed

October 30, 2015

Patent Citations Received

‌

US Patent D1008986 Ion shield plate for plasma processing apparatus

Patent Primary Examiner

‌

Thomas Johannes

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