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US Patent D741823 Vaporizer for substrate processing apparatus

Patent D741823 was granted and assigned to Hitachi Kokusai Electric Inc. on October, 2015 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Patent Applicant

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Hitachi Kokusai Electric Inc.

Current Assignee

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Hitachi Kokusai Electric Inc.

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D7418230

Date of Patent

October 27, 2015

Patent Application Number

294788360

Date Filed

January 9, 2014

Patent Citations Received

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US Patent D1038901 Collimator for a physical vapor deposition chamber

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US Patent D1009816 Collimator for a physical vapor deposition chamber

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US Patent D1009943 Air bag detonator

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US Patent D998575 Collimator for use in a physical vapor deposition (PVD) chamber

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US Patent D1007449 Target profile for a physical vapor deposition chamber target

Patent Primary Examiner

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Elizabeth J Oswecki

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