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US Patent D871609 Electrode plate peripheral ring for a plasma processing apparatus

Patent D871609 was granted and assigned to Hitachi on December, 2019 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Patent Applicant

Hitachi

Current Assignee

Hitachi

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D871609

Patent Inventor Names

Kenetsu Yokogawa0

Masahito Mori0

Masakazu Isozaki0

Takahisa Hashimoto0

Takao Arase0

Date of Patent

December 31, 2019

Patent Application Number

29635296

Date Filed

January 30, 2018

Patent Citations Received

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US Patent D1008782 Wall plate

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US Patent D1049067 Ring for an anti-rotation process kit for a substrate processing chamber

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US Patent D1008986 Ion shield plate for plasma processing apparatus

Patent Primary Examiner

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Susan Bennett Hattan

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