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US Patent D965740 Gas supply nozzle for substrate processing apparatus

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Is a

Patent

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D9657400

Patent Inventor Names

Satoshi Fujii0

Makoto Sambu0

Date of Patent

October 4, 2022

Patent Application Number

297677250

Date Filed

January 25, 2021

Patent Citations Received

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US Patent D987037 Nozzle adapter

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US Patent D1042731 Gas nozzle for semiconductor manufacturing equipment

Patent Primary Examiner

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