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US Patent D1042731 Gas nozzle for semiconductor manufacturing equipment

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Atsushi Hirano0

Date of Patent

September 17, 2024

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Patent Application Number

298612100

Date Filed

November 28, 2022

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Patent Citations

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US Patent 10960415 Spray nozzle and method

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US Patent D937385 Return nozzle

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US Patent D965740 Gas supply nozzle for substrate processing apparatus

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US Patent D1020668 Gas injector for substrate processing apparatus

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US Patent D783351 Gas nozzle substrate processing apparatus

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Patent Primary Examiner

Elizabeth J Oswecki

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CPC Code

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