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US Patent D783351 Gas nozzle substrate processing apparatus

Patent D783351 was granted and assigned to Hitachi Kokusai Electric Inc. on April, 2017 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Patent Applicant

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Hitachi Kokusai Electric Inc.

Current Assignee

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Hitachi Kokusai Electric Inc.

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D7833510

Patent Inventor Names

Ryota Sasajima0

Kosuke Takagi0

Toshiki Fujino0

Date of Patent

April 11, 2017

Patent Application Number

295449770

Date Filed

November 9, 2015

Patent Citations Received

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US Patent D1042731 Gas nozzle for semiconductor manufacturing equipment

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US Patent D1020668 Gas injector for substrate processing apparatus

Patent Primary Examiner

Robin V. Webster

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