US Patent RE40100 Fabrication of B/C/N/O/Si doped sputtering targets

Patent RE40100 was granted and assigned to Heraeus on February, 2008 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Heraeus

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

RE401000

Patent Inventor Names

Wenjun Zhang0

Date of Patent

February 26, 2008

Patent Application Number

109790470

Date Filed

November 2, 2004

Patent Primary Examiner

‌

Ngoclan T. Mai

Patent abstract

The present invention relates to a method of manufacturing sputtering targets doped with non-metal components including boron, carbon, nitrogen, oxygen and silicon. A powder process is utilized whereby alloyed powders, which contain non-metal elements of B/C/N/O/Si and non-metal containing phases of less than ten microns in microstructure, are blended, canned and subjected to hot isostatic press consolidation. The sputtering targets of the present invention avoid spitting problems during sputtering of the target material on a substrate.

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