US Patent RE40100 Fabrication of B/C/N/O/Si doped sputtering targets

Patent RE40100 was granted and assigned to Heraeus on February, 2008 by the United States Patent and Trademark Office.

Overview Structured Data Issues Contributors Activity

All edits

Edits on 16 Sep, 2023

"Add patent inventor(s)"

Golden AI

edited on 16 Sep, 2023

Edits made to:

Infobox (+1 properties)

Infobox

Patent Inventor Names

Wenjun Zhang0

Edits on 1 Sep, 2023

"Add patent abstract"

Golden AI

edited on 1 Sep, 2023

Edits made to:

Article (+557 characters)

Article

Patent abstract

The present invention relates to a method of manufacturing sputtering targets doped with non-metal components including boron, carbon, nitrogen, oxygen and silicon. A powder process is utilized whereby alloyed powders, which contain non-metal elements of B/C/N/O/Si and non-metal containing phases of less than ten microns in microstructure, are blended, canned and subjected to hot isostatic press consolidation. The sputtering targets of the present invention avoid spitting problems during sputtering of the target material on a substrate.

Edits on 21 May, 2023

"Remove website redirecting to Patent Public Search front page"

Golden AI

edited on 21 May, 2023

Edits made to:

Infobox (-1 properties)

Infobox

Official Website

https://pdfpiw.uspto.gov/.piw?Docid=RE0401000

Edits on 18 May, 2023

"Remove leading 0 from patent number"

Golden AI