List of Tessera (company) patents

Patents where

Current Assignee

Name

Tessera (company)

Name	Description	Patent Applicant	Current Assignee	Patent Jurisdiction	Patent Number	Date of Patent
‌ US Patent 11380589 Selective removal of semiconductor fins		Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11380589	July 5, 2022
‌ US Patent 11342446 Nanosheet field effect transistors with partial inside spacers	Patent 11342446 was granted and assigned to Tessera (company) on May, 2022 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11342446	May 24, 2022
‌ US Patent 11380583 Forming self-aligned vias and air-gaps in semiconductor fabrication		Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11380583	July 5, 2022
‌ US Patent 10998314 Gate cut with integrated etch stop layer	Patent 10998314 was granted and assigned to Tessera (company) on May, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	10998314	May 4, 2021
‌ US Patent 10998240 Fabrication of a vertical fin field effect transistor with reduced dimensional variations	Patent 10998240 was granted and assigned to Tessera (company) on May, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	10998240	May 4, 2021
‌ US Patent 11404560 Punch through stopper in bulk finFET device		Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11404560	August 2, 2022
‌ US Patent 11342230 Homogeneous densification of fill layers for controlled reveal of vertical fins	Patent 11342230 was granted and assigned to Tessera (company) on May, 2022 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11342230	May 24, 2022
‌ US Patent 11276612 Hybrid-channel nano-sheet FETS	Patent 11276612 was granted and assigned to Tessera (company) on March, 2022 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11276612	March 15, 2022
‌ US Patent 11302533 Selective gas etching for self-aligned pattern transfer		Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11302533	April 12, 2022
‌ US Patent 11056429 Semiconductor device including a porous dielectric layer, and method of forming the semiconductor device	Patent 11056429 was granted and assigned to Tessera (company) on July, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11056429	July 6, 2021
‌ US Patent 11043581 Nanosheet channel-to-source and drain isolation	Patent 11043581 was granted and assigned to Tessera (company) on June, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11043581	June 22, 2021
‌ US Patent 10978550 Efficient metal-insulator-metal capacitor	Patent 10978550 was granted and assigned to Tessera (company) on April, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	10978550	April 13, 2021
‌ US Patent 11018007 Self aligned pattern formation post spacer etchback in tight pitch configurations	Patent 11018007 was granted and assigned to Tessera (company) on May, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11018007	May 25, 2021
‌ US Patent 11024715 FinFET gate cut after dummy gate removal	Patent 11024715 was granted and assigned to Tessera (company) on June, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11024715	June 1, 2021
‌ US Patent 10964588 Selective ILD deposition for fully aligned via with airgap	Patent 10964588 was granted and assigned to Tessera (company) on March, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	10964588	March 30, 2021
‌ US Patent 11049953 Nanosheet transistor	Patent 11049953 was granted and assigned to Tessera (company) on June, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11049953	June 29, 2021
‌ US Patent 11031248 Alternating hardmasks for tight-pitch line formation	Patent 11031248 was granted and assigned to Tessera (company) on June, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11031248	June 8, 2021
‌ US Patent 10923471 Minimizing shorting between FinFET epitaxial regions	Patent 10923471 was granted and assigned to Tessera (company) on February, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	10923471	February 16, 2021
‌ US Patent 10930504 Selective gas etching for self-aligned pattern transfer	Patent 10930504 was granted and assigned to Tessera (company) on February, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	10930504	February 23, 2021
‌ US Patent 10937861 Semiconductor structures including middle-of-line (MOL) capacitance reduction for self-aligned contact in gate stack	Patent 10937861 was granted and assigned to Tessera (company) on March, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	10937861	March 2, 2021
‌ US Patent 10930553 Forming self-aligned vias and air-gaps in semiconductor fabrication	Patent 10930553 was granted and assigned to Tessera (company) on February, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	10930553	February 23, 2021
‌ US Patent 10957584 Structure and method to improve FAV RIE process margin and electromigration	Patent 10957584 was granted and assigned to Tessera (company) on March, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	10957584	March 23, 2021
‌ US Patent 10985056 Structure and method to improve FAV RIE process margin and Electromigration	Patent 10985056 was granted and assigned to Tessera (company) on April, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	10985056	April 20, 2021
‌ US Patent 11257717 Selective recessing to form a fully aligned via	Patent 11257717 was granted and assigned to Tessera (company) on February, 2022 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11257717	February 22, 2022
‌ US Patent 11004933 Field effect transistor structures	Patent 11004933 was granted and assigned to Tessera (company) on May, 2021 by the United States Patent and Trademark Office.	Tessera (company)	Tessera (company)	United States Patent and Trademark Office	11004933	May 11, 2021

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