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US Patent 10047435 Dual selective deposition

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US Patent 11993842 Selective deposition of metal oxide by pulsed chemical vapor deposition
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US Patent 11942426 Semiconductor structure having alternating selective metal and dielectric layers
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Patent abstract

Methods are provided for dual selective deposition of a first material on a first surface of a substrate and a second material on a second, different surface of the same substrate. The selectively deposited materials may be, for example, metal, metal oxide, or dielectric materials.

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US Patent 11830732 Selective passivation and selective deposition
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US Patent 11804373 Selective layer formation using deposition and removing
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Patent Inventor Names
Antti Niskanen0
Eva Tois0
Hannu Huotari0
Marko Tuominen0
Raija H. Matero0
Suvi P. Haukka0
Viljami J. Pore0
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US Patent 11643720 Selective deposition of silicon oxide on metal surfaces
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US Patent D947913 Susceptor shaft
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