US Patent 10090161 Plasma etching apparatus and plasma etching method
Patent 10090161 was granted and assigned to Tokyo Electron on October, 2018 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
January 12, 2017
Date of Patent
October 2, 2018
Patent Applicant
Patent Application Number
15404471
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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