Patent 10191215 was granted and assigned to École Polytechnique Fédérale de Lausanne on January, 2019 by the United States Patent and Trademark Office.
A waveguide fabrication method including the steps of providing a substrate including at least one waveguide recess structure and a stress release recess structure for receiving a waveguide material, and depositing the waveguide material onto the substrate and into both the waveguide recess structure and the stress release recess structure.