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US Patent 10431495 Semiconductor device with local connection
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Patent
Date Filed
July 23, 2018
Date of Patent
October 1, 2019
Patent Application Number
16042561
Patent Citations Received
US Patent 12125886 Fin field-effect transistor device and method
0
US Patent 10790393 Utilizing multilayer gate spacer to reduce erosion of semiconductor Fin during spacer patterning
US Patent 11569356 Scaled gate contact and source/drain cap
US Patent 10886378 Method of forming air-gap spacers and gate contact over active region and the resulting device
0
US Patent 10892338 Scaled gate contact and source/drain cap
US Patent 10930568 Method and structure to improve overlay margin of non-self-aligned contact in metallization layer
US Patent 11444018 Semiconductor device including recessed interconnect structure
US Patent 11942420 Semiconductor device including recessed interconnect structure
0
Patent Inventor Names
Carl Radens
0
Junli Wang
0
Kangguo Cheng
0
Lawrence A. Clevenger
0
John H. Zhang
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
10431495
Patent Primary Examiner
John P. Dulka
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