Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 29, 2019
Patent Application Number
14168114
Date Filed
January 30, 2014
Patent Citations Received
Patent Primary Examiner
Patent abstract
The present disclosure provides a lithography system. The lithography system includes an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism.
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