Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Takeshi Sasami0
Jun Hatakeyama0
Masaki Ohashi0
Date of Patent
November 12, 2019
0Patent Application Number
157254040
Date Filed
October 5, 2017
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A resist composition comprising a base polymer and a metal salt of carboxylic acid or sulfonamide is provided, the metal being selected from calcium, strontium, barium, cerium, aluminum, indium, gallium, thallium scandium, and yttrium. The resist composition exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
