US Patent 10495968 Iodine-containing polymers for chemically amplified resist compositions

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Is a

Patent

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

104959680

Patent Inventor Names

James W. Thackeray0

Emad Aqad0

James F. Cameron0

Date of Patent

December 3, 2019

Patent Application Number

156238920

Date Filed

June 15, 2017

Patent Citations Received

‌

US Patent 11835860 Resist composition and patterning process

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US Patent 10915021 Monomer, polymer, resist composition, and patterning process

‌

US Patent 11460772 Positive resist composition and patterning process

Patent Primary Examiner

‌

Amanda C. Walke

Patent abstract

A monomer having formula (I):

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