Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Masahiro Fukushima0
Jun Hatakeyama0
Koji Hasegawa0
Date of Patent
February 9, 2021
0Patent Application Number
161219700
Date Filed
September 5, 2018
0Patent Citations
Patent Citations Received
Patent Primary Examiner
Patent abstract
A monomer having formula (A) is provided. RA is H, methyl or trifluoromethyl, X1 is a single bond, ether, ester or amide bond, Ra is a C1-C20 monovalent hydrocarbon group, Rb is H or an acid labile group, X is halogen, n is an integer of 1 to 4, m is an integer of 0 to 3, and 1≤n+m≤4. A resist composition comprising a polymer derived from the monomer has a high sensitivity to high-energy radiation, especially EUV.
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