Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 4, 2022
Patent Application Number
16717022
Date Filed
December 17, 2019
Patent Citations
Patent Primary Examiner
A positive resist composition comprising a base polymer comprising recurring units containing an optionally substituted amino group and iodine exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.
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