US Patent 10520809 Resist composition and patterning process
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Patent abstract
A resist composition comprising a base polymer and a metal salt of an iodinated aromatic group-containing carboxylic acid, the metal being selected from among sodium, magnesium, potassium, calcium, rubidium, strontium, cesium, barium, cobalt, nickel, copper, zinc, cadmium, tin, antimony, zirconium, hafnium, cerium, aluminum, and indium, exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
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Patent Inventor Names
Jun Hatakeyama0
Masaki Ohashi0
Takeshi Sasami0
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US Patent 10520809 Resist composition and patterning process
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Patent jurisdiction
Patent number
10520809
Date of patent
December 31, 2019
Patent application number
15700609
Date Filed
September 11, 2017
Patent citations
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