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US Patent 11327400 Patterning process

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Tomohiro Kobayashi0

Jun Hatakeyama0

Takeshi Sasami0

Date of Patent

May 10, 2022

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Patent Application Number

161945930

Date Filed

November 19, 2018

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Patent Citations

US Patent 10606172 Resist composition and patterning process

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US Patent 10613436 Resist composition and patterning process

US Patent 10613437 Resist composition and patterning process

US Patent 10725378 Resist composition and patterning process

US Patent 10802400 Resist composition and patterning process

US Patent 10816899 Resist composition and patterning process

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US Patent 11022883 Resist composition and patterning process

US Patent 10968175 Resist composition and patterning process

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Patent Primary Examiner

Daborah Chacko-Davis

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CPC Code

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A pattern having a good balance of sensitivity, resolution and LWR is formed by providing a resist film comprising a base resin comprising recurring units having a C

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