Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Daisuke Domon0
Jun Hatakeyama0
Date of Patent
April 6, 2021
0Patent Application Number
161427600
Date Filed
September 26, 2018
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating a brominated benzene-containing sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
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