US Patent 10968175 Resist composition and patterning process
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Patent abstract
A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating a brominated benzene-containing sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
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Patent Inventor Names
Daisuke Domon0
Jun Hatakeyama0
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Patent Number
109681750
Date of Patent
April 6, 2021
0Patent Application Number
161427600
Date Filed
September 26, 2018
0Official Website
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US Patent 10968175 Resist composition and patterning process
Infobox
Is a
Patent jurisdiction
Patent number
10968175
Date of patent
April 6, 2021
Patent application number
16142760
Date Filed
September 26, 2018
Patent primary examiner
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