Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jun Hatakeyama0
Takayuki Fujiwara0
Date of Patent
February 27, 2024
0Patent Application Number
168777420
Date Filed
May 19, 2020
0Patent Citations
...
Patent Primary Examiner
Patent abstract
A resist composition comprising a base polymer and an acid generator containing a sulfonium salt which is structured such that an iodized or brominated hydrocarbyl group (exclusive of iodized or brominated aromatic ring) is bonded to a benzene ring via an ester bond-containing group offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
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