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US Patent 11914291 Resist composition and patterning process

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
May 19, 2020
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Date of Patent
February 27, 2024
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Patent Application Number
16877742
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Patent Citations
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US Patent 11181823 Resist composition and patterning process
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US Patent 10968175 Resist composition and patterning process
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US Patent 11175580 Resist composition and patterning process
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US Patent 8785105 Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method
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US Patent 9052592 Resist composition and resist pattern forming method
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US Patent 9233919 Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method
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US Patent 9766541 Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound
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US Patent 10295904 Resist composition and patterning process
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US Patent 10437147 Resist composition and method for forming resist pattern
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Patent Inventor Names
Jun Hatakeyama
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Takayuki Fujiwara
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11914291
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Patent Primary Examiner
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Daborah Chacko-Davis
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CPC Code
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G03F 7/039
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G03F 7/0382
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G03F 7/0045
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G03F 7/004
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G03F 7/0392
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