US Patent 11914291 Resist composition and patterning process
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US Patent 11914291 Resist composition and patterning process
Article
Patent abstract
A resist composition comprising a base polymer and an acid generator containing a sulfonium salt which is structured such that an iodized or brominated hydrocarbyl group (exclusive of iodized or brominated aromatic ring) is bonded to a benzene ring via an ester bond-containing group offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
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Patent Number
Patent Inventor Names
Jun Hatakeyama0
Takayuki Fujiwara0
Date of Patent
February 27, 2024
0Patent Application Number
168777420
Date Filed
May 19, 2020
0Patent Citations
Patent Primary Examiner
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