Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 16, 2021
Patent Application Number
16565776
Date Filed
September 10, 2019
Patent Citations Received
Patent Primary Examiner
Patent abstract
A resist composition comprising a base polymer and an acid generator containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
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