US Patent 11175580 Resist composition and patterning process
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Patent abstract
A resist composition comprising a base polymer and an acid generator containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
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Patent Number
111755800
Date of Patent
November 16, 2021
0Patent Application Number
165657760
Date Filed
September 10, 2019
0Official Website
Patent Primary Examiner
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Patent Jurisdiction
Patent Number
111755800
Date of Patent
November 16, 2021
0Patent Application Number
165657760
Date Filed
September 10, 2019
0Official Website
Patent Primary Examiner
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US Patent 11175580 Resist composition and patterning process
Infobox
Is a
Patent jurisdiction
Patent number
11175580
Date of patent
November 16, 2021
Patent application number
16565776
Date Filed
September 10, 2019
Patent primary examiner
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