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US Patent 10968175 Resist composition and patterning process
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Patent
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Date Filed
September 26, 2018
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Date of Patent
April 6, 2021
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Patent Application Number
16142760
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Patent Citations Received
US Patent 11656548 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device
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US Patent 11914291 Resist composition and patterning process
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US Patent 11372329 Resist composition and method of forming resist pattern
US Patent 11327400 Patterning process
Patent Inventor Names
Daisuke Domon
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Jun Hatakeyama
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10968175
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Patent Primary Examiner
Amanda C. Walke
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