Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Masaki Ohashi0
Jun Hatakeyama0
Date of Patent
June 1, 2021
0Patent Application Number
159786810
Date Filed
May 14, 2018
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A resist composition contains a polymer-bound acid generator, specifically a polymer comprising recurring units derived from a sulfonium or iodonium salt having a polymerizable unsaturated bond and containing iodine in the linker between the polymerizable unsaturated bond and a fluorosulfonic acid. The resist composition offers a high sensitivity and improved CDU independent of whether it is of positive or negative tone.
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