US Patent 11022883 Resist composition and patterning process
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Patent abstract
A resist composition contains a polymer-bound acid generator, specifically a polymer comprising recurring units derived from a sulfonium or iodonium salt having a polymerizable unsaturated bond and containing iodine in the linker between the polymerizable unsaturated bond and a fluorosulfonic acid. The resist composition offers a high sensitivity and improved CDU independent of whether it is of positive or negative tone.
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Patent Inventor Names
Jun Hatakeyama0
Masaki Ohashi0
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Patent Number
110228830
Date of Patent
June 1, 2021
0Patent Application Number
159786810
Date Filed
May 14, 2018
0Official Website
Patent Citations Received
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US Patent 11022883 Resist composition and patterning process
Infobox
Is a
Patent jurisdiction
Patent number
11022883
Date of patent
June 1, 2021
Patent application number
15978681
Date Filed
May 14, 2018
Patent primary examiner
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