US Patent 10520811 Resist composition and patterning process
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Patent abstract
A resist composition comprising a base polymer and a quencher in the form of an iodonium salt of fluorinated aminobenzoic acid, fluorinated nitrobenzoic acid or fluorinated hydroxybenzoic acid offers a high dissolution contrast and minimal LWR independent of whether it is of positive or negative tone.
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Patent Jurisdiction
Patent Number
105208110
Date of Patent
December 31, 2019
0Patent Application Number
158916330
Date Filed
February 8, 2018
0Patent Citations Received
Patent Primary Examiner
Edits on 26 Sep, 2022
Golden AI
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Is a
Patent Jurisdiction
Patent Number
105208110
Date of Patent
December 31, 2019
0Patent Application Number
158916330
Date Filed
February 8, 2018
0Patent Citations Received
Patent Primary Examiner
Edits on 19 May, 2022
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Patent citations received
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US Patent 10520811 Resist composition and patterning process
Infobox
Is a
Patent jurisdiction
Patent number
10520811
Date of patent
December 31, 2019
Patent application number
15891633
Date Filed
February 8, 2018
Patent primary examiner
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