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US Patent 10607813 Synchronized pulsing of plasma processing source and substrate bias

Patent 10607813 was granted and assigned to ADVANCED ENERGY INDUSTRIES, INC. on March, 2020 by the United States Patent and Trademark Office.

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US Patent 12125674 Surface charge and power feedback and control using a switch mode bias system
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US Patent 12111341 In-situ electric field detection method and apparatus
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 11978613 Transition control in a bias supply
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US Patent 11972924 Pulsed voltage source for plasma processing applications
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US Patent 11942309 Bias supply with resonant switching
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US Patent 11887812 Bias supply with a single controlled switch
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US Patent 11871503 Plasma processing method and plasma processing apparatus
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US Patent 11842884 Spatial monitoring and control of plasma processing environments
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US Patent 11670487 Bias supply control and data processing
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Infobox
Is a
Patent
Patent
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Patent Applicant
ADVANCED ENERGY INDUSTRIES, INC.
ADVANCED ENERGY INDUSTRIES, INC.
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Current Assignee
ADVANCED ENERGY INDUSTRIES, INC.
ADVANCED ENERGY INDUSTRIES, INC.
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
106078130
Date of Patent
March 31, 2020
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Patent Application Number
161937900
Date Filed
November 16, 2018
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Patent Citations Received
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US Patent 10791617 Method of controlling ion energy distribution using a pulse generator with a current-return output stage
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US Patent 10886105 Impedance matching method, impedance matching device and plasma generating apparatus
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US Patent 10896807 Synchronization between an excitation source and a substrate bias supply
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US Patent 11264209 Application of modulating supplies in a plasma processing system
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US Patent 11282677 Spatial monitoring and control of plasma processing environments
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US Patent 11284500 Method of controlling ion energy distribution using a pulse generator
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US Patent 11337297 Plasma processing method and plasma processing apparatus
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US Patent 11450510 Inter-period control system for plasma power delivery system and method of operating same
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US Patent 11462388 Plasma processing assembly using pulsed-voltage and radio-frequency power
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US Patent 11462389 Pulsed-voltage hardware assembly for use in a plasma processing system
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US Patent 11476090 Voltage pulse time-domain multiplexing
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US Patent 11476145 Automatic ESC bias compensation when using pulsed DC bias
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US Patent 11495470 Method of enhancing etching selectivity using a pulsed plasma
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US Patent 11508554 High voltage filter assembly
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US Patent 11569066 Pulsed voltage source for plasma processing applications
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US Patent 11610761 Synchronization between an excitation source and a substrate bias supply
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US Patent 11610763 Inter-period control system for plasma power delivery system and method of operating the same
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Patent Primary Examiner
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Renan Luque
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