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US Patent 10643826 Methods for thermally calibrating reaction chambers

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
October 6, 2017
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Date of Patent
May 5, 2020
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Patent Application Number
15727432
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Patent Citations
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US Patent 10290508 Method for forming vertical spacers for spacer-defined patterning
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US Patent 10340125 Pulsed remote plasma method and system
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US Patent 10340135 Method of topologically restricted plasma-enhanced cyclic deposition of silicon or metal nitride
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US Patent 10343920 Aligned carbon nanotubes
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US Patent 10347547 Suppressing interfacial reactions by varying the wafer temperature throughout deposition
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US Patent 10361201 Semiconductor structure and device formed using selective epitaxial process
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US Patent 10032628 Source/drain performance through conformal solid state doping
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US Patent 10018920 Lithography patterning with a gas phase resist
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US Patent 10023960 Process gas management for an inductively-coupled plasma deposition reactor
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US Patent 10032792 Semiconductor device and manufacturing method thereof
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•••
Patent Citations Received
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US Patent 10883885 Method for calibrating a temperature measuring device of a dental oven and calibration element
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US Patent 11032945 Heat shield assembly for an epitaxy chamber
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10643826
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Patent Primary Examiner
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Ricky Ngon
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