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US Patent 10643826 Methods for thermally calibrating reaction chambers

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=106438260

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Patent Citations

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US Patent 10186420 Formation of silicon-containing thin films

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US Patent 10276355 Multi-zone reactor, system including the reactor, and method of using the same

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Golden AI

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US Patent 10018920 Lithography patterning with a gas phase resist

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US Patent 10087522 Deposition of metal borides

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US Patent 10179947 Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition

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Golden AI

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US Patent 10047435 Dual selective deposition

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US Patent 10134757 Method of processing a substrate and a device manufactured by using the method

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US Patent 10106892 Thermal oxide equivalent low temperature ALD oxide for dual purpose gate oxide and method for producing the same

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Patent Citations Received

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US Patent 11032945 Heat shield assembly for an epitaxy chamber

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Golden AI

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US Patent 10269558 Method of forming a structure on a substrate

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Golden AI

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US Patent 10177025 Method and apparatus for filling a gap

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US Patent 10229833 Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures

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US Patent 10090316 3D stacked multilayer semiconductor memory using doped select transistor channel

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Golden AI

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US Patent 10343920 Aligned carbon nanotubes

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US Patent 10290508 Method for forming vertical spacers for spacer-defined patterning

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Golden AI

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US Patent 10319588 Method for depositing a metal chalcogenide on a substrate by cyclical deposition

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US Patent 10103040 Apparatus and method for manufacturing a semiconductor device

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US Patent 10312055 Method of depositing film by PEALD using negative bias

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Golden AI

edited on 22 Mar, 2023

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Patent Citations

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US Patent 10190213 Deposition of metal borides

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