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US Patent 10648788 Substrate distance monitoring
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Patent
Current Assignee
Applied Materials
Date Filed
May 10, 2017
Date of Patent
May 12, 2020
Patent Applicant
Applied Materials
Patent Application Number
15591902
Patent Citations
US Patent 10481122 Gas sensor element and gas sensor
US Patent 10514356 Gas sensor
US Patent 10508338 Device for atomic layer deposition
US Patent 10184786 Wear amount measuring apparatus and method, temperature measuring apparatus and method and substrate processing system
US Patent 10196741 Wafer placement and gap control optimization through in situ feedback
US Patent 10312120 Position and temperature monitoring of ALD platen susceptor
US Patent 10403476 Active showerhead
US Patent 10460916 Real time monitoring with closed loop chucking force control
Patent Citations Received
US Patent 11296189 Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
US Patent 11289326 Method for reforming amorphous carbon polymer film
US Patent D947913 Susceptor shaft
US Patent 11295980 Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
US Patent 11242598 Structures including metal carbide material, devices including the structures, and methods of forming same
US Patent 11244825 Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
US Patent 11001925 Substrate processing apparatus
US Patent 11004977 Method for depositing a group IV semiconductor and related semiconductor device structures
US Patent 11015245 Gas-phase reactor and system having exhaust plenum and components thereof
US Patent 11018002 Method for selectively depositing a Group IV semiconductor and related semiconductor device structures
•••
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
10648788
Patent Primary Examiner
Rudy Zervigon
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