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US Patent 10714315 Semiconductor reaction chamber showerhead

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Is a

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Date of Patent

July 14, 2020

Patent Application Number

13651144

Date Filed

October 12, 2012

Patent Citations

US Patent 10312055 Method of depositing film by PEALD using negative bias

US Patent 10347547 Suppressing interfacial reactions by varying the wafer temperature throughout deposition

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US Patent 10361201 Semiconductor structure and device formed using selective epitaxial process

US Patent 10395917 Si precursors for deposition of SiN at low temperatures

US Patent 10395919 Method and apparatus for filling a gap

US Patent 10032628 Source/drain performance through conformal solid state doping

US Patent 10018920 Lithography patterning with a gas phase resist

US Patent 10023960 Process gas management for an inductively-coupled plasma deposition reactor

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Patent Citations Received

US Patent 11447866 High temperature chemical vapor deposition lid

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Patent Primary Examiner

Charlee J. C. Bennett

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