Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tomohiko Kitajima0
Abhijit Basu Mallick0
Bo Qi0
Harry S. Whitesell0
Huiyuan Wang0
Pramit Manna0
Rui Cheng0
Shishi Jiang0
Date of Patent
January 5, 2021
0Patent Application Number
165232620
Date Filed
July 26, 2019
0Patent Citations
Patent Citations Received
Patent Primary Examiner
Patent abstract
Methods of etching film stacks to from gaps of uniform width are described. A film stack is etched through a hardmask. A conformal liner is deposited in the gap. The bottom of the liner is removed. The film stack is selectively etched relative to the liner. The liner is removed. The method may be repeated to a predetermined depth.
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