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US Patent 10886140 3D NAND etch

Patent 10886140 was granted and assigned to Applied Materials on January, 2021 by the United States Patent and Trademark Office.

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Patent Citations Received
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US Patent 12027374 Processes to deposit amorphous-silicon etch protection liner
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Patent abstract

Methods of etching film stacks to from gaps of uniform width are described. A film stack is etched through a hardmask. A conformal liner is deposited in the gap. The bottom of the liner is removed. The film stack is selectively etched relative to the liner. The liner is removed. The method may be repeated to a predetermined depth.

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Patent Inventor Names
Abhijit Basu Mallick0
Bo Qi0
Harry S. Whitesell0
Huiyuan Wang0
Pramit Manna0
Rui Cheng0
Shishi Jiang0
Tomohiko Kitajima0
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Patent Citations Received
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US Patent 11702751 Non-conformal high selectivity film for etch critical dimension control
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=108861400
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Infobox
Is a
Patent
Patent
0
Patent Applicant
Applied Materials
Applied Materials
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Current Assignee
Applied Materials
Applied Materials
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
108861400
Date of Patent
January 5, 2021
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Patent Application Number
165232620
Date Filed
July 26, 2019
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=108861400
Patent Citations
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US Patent 10147638 Methods of forming staircase structures
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Patent Citations Received
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US Patent 11361971 High aspect ratio Bosch deep etch
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Patent Primary Examiner
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Allan W. Olsen
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=10886140
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Patent citations received
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US Patent 11361971 High aspect ratio Bosch deep etch
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 US Patent 10886140 3D NAND etch

Infobox
Is a
Patent
Patent
Patent applicant
Applied Materials
Applied Materials
Current assignee
Applied Materials
Applied Materials
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
10886140
Date of patent
January 5, 2021
Patent application number
16523262
Date Filed
July 26, 2019
Patent citations
‌
US Patent 10147638 Methods of forming staircase structures
Patent primary examiner
‌
Allan W. Olsen

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