Patent attributes
A memory device comprises a plurality of stacks of word lines alternating with insulating strips, the stacks being separated by trenches, the word lines extending in a first direction. A plurality of columns of vertical conductive structures is disposed in the trenches between adjacent stacks. Multi-layer films of memory material and channel material are disposed on sidewalls of word lines on at least one side of the trenches between adjacent vertical conductive structures in the plurality of vertical conductive structure, the channel material in ohmic contact with the vertical conductive structures. At locations of vertical conductive structures in the plurality of vertical conductive structures, the sidewalls of the word lines are recessed between insulating strips in the stacks to form recesses on the sidewalls of the word lines to isolate the word lines from vertical conductive structures.
