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US Patent 10998209 Substrate processing platforms including multiple processing chambers

Patent 10998209 was granted and assigned to Applied Materials on May, 2021 by the United States Patent and Trademark Office.

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Contents

Is a
Patent
Patent

Patent attributes

Patent Applicant
Applied Materials
Applied Materials
Current Assignee
Applied Materials
Applied Materials
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10998209
Patent Inventor Names
Thomas Brezoczky0
Kirankumar Neelasandra Savandaiah0
Srinivasa Rao Yedla0
Date of Patent
May 4, 2021
Patent Application Number
16427642
Date Filed
May 31, 2019
Patent Citations
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US Patent 10170347 Substrate processing system
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US Patent 10202682 Method of sputtering and sputter system
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US Patent 10202687 Substrate processing method and substrate processing apparatus
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US Patent 10221480 Substrate processing apparatus and substrate processing method
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US Patent 10256125 Wafer processing systems including multi-position batch load lock apparatus with temperature control capability
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US Patent 10262888 Apparatus and methods for wafer rotation in carousel susceptor
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US Patent 10347470 Process chamber and semiconductor processing apparatus
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US Patent 10347515 Method for manufacturing workpieces and apparatus
...
Patent Primary Examiner
‌
James Keenan
Patent abstract

Methods and apparatus for substrate processing are provided herein. The apparatus, for example, can include a plurality of multi environment chambers coupled to a buffer chamber configured to load a substrate therefrom into each of the plurality of multi environment chambers for processing of the substrate using a plurality of processing mini environment chambers coupled to each of the plurality of multi environment chambers, at least one of the plurality of multi environment chambers comprising a robot and at least one of the plurality of multi environment chambers comprising a carousel, wherein each of the robot and the carousel is configured to transfer the substrate to and from each of the processing mini environment chamber of the plurality of processing mini environment chambers.

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