Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
June 8, 2021
Patent Application Number
16430504
Date Filed
June 4, 2019
Patent Citations
Patent Citations Received
Patent Primary Examiner
Patent abstract
A semiconductor device includes a gate having a gate spacer formed on a semiconductor substrate and a source or drain (S/D) formed on the substrate a distance away from the gate. A S/D contact including a contact spacer is formed on an upper surface of the S/D. A dielectric layer is interposed between the gate spacer and the contact spacer; and an airgap is in the dielectric layer.
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