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US Patent 11047040 Dual selective deposition

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
October 7, 2019
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Date of Patent
June 29, 2021
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Patent Application Number
16594365
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Patent Citations
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US Patent 10047435 Dual selective deposition
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US Patent 10049924 Selective formation of metallic films on metallic surfaces
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US Patent 10115603 Removal of surface passivation
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US Patent 10157786 Selective formation of metallic films on metallic surfaces
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US Patent 10186420 Formation of silicon-containing thin films
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US Patent 10204782 Combined anneal and selective deposition process
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US Patent 10343186 Vapor phase deposition of organic films
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US Patent 10373820 Deposition of organic films
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US Patent 10428421 Selective deposition on metal or metallic surfaces relative to dielectric surfaces
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US Patent 10443123 Dual selective deposition
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Patent Inventor Names
Viljami J. Pore
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Marko Tuominen
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Raija H. Matero
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Suvi P. Haukka
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Antti Niskanen
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Eva Tois
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Hannu Huotari
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11047040
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Patent Primary Examiner
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Elizabeth A Burkhart
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