US Patent 11048165 Resist composition and patterning process
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Patent abstract
A resist composition comprising a base polymer and a sulfonium salt of brominated indole or brominated indazole carboxylic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
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Patent Inventor Names
Daisuke Domon0
Jun Hatakeyama0
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Patent Number
110481650
Date of Patent
June 29, 2021
0Patent Application Number
161425520
Date Filed
September 26, 2018
0Official Website
Patent Citations Received
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US Patent 11048165 Resist composition and patterning process
Infobox
Is a
Patent jurisdiction
Patent number
11048165
Date of patent
June 29, 2021
Patent application number
16142552
Date Filed
September 26, 2018
Patent primary examiner
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