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US Patent 11069510 Substrate processing apparatus

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Is a

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Ki Chul Um0

Hyun Soo Jang0

Jeong Ho Lee0

Yong Gyu Han0

Date of Patent

July 20, 2021

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Patent Application Number

161167080

Date Filed

August 29, 2018

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Patent Citations

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US Patent 10714335 Method of depositing thin film and method of manufacturing semiconductor device

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US Patent 10763139 Vacuum transfer module and substrate processing apparatus

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Patent Primary Examiner

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Patent abstract

A plasma supply unit includes a first conductive portion, a second conductive portion having at least a part extending to overlap the first conductive portion, and a ground shield located between the first conductive portion and the second conductive portion, and a substrate processing apparatus including the plasma supply unit.

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