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US Patent 11069510 Substrate processing apparatus

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
August 29, 2018
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Date of Patent
July 20, 2021
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Patent Application Number
16116708
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Patent Citations
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US Patent 10395919 Method and apparatus for filling a gap
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US Patent 10529554 Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
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US Patent 10590531 Substrate processing apparatus, and method of manufacturing semiconductor device
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US Patent 10600637 Formation of SiOC thin films
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US Patent 10622196 Plasma processing apparatus
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US Patent 10648788 Substrate distance monitoring
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US Patent 10714335 Method of depositing thin film and method of manufacturing semiconductor device
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US Patent 10763139 Vacuum transfer module and substrate processing apparatus
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US Patent 10032628 Source/drain performance through conformal solid state doping
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US Patent 10014212 Selective deposition of metallic films
•••
Patent Inventor Names
Ki Chul Um
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Hyun Soo Jang
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Jeong Ho Lee
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Yong Gyu Han
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11069510
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Patent Primary Examiner
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Ram N Kackar
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